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Osmium Plasma Coater
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- Conductive ultra-thin film
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Vacuum Electron Staining Apparatus

Conductive thin film production device for electron microscope sample preparation
Osmium Plasma Coater
Product details/Lineup/Accessories/Technical data/Contract service/Maintenance
Touch Panel Models/Standard Models/Model with option mechanism (Conductive ultra-thin film/Hydrophilization treatment/Deep sample)

Osmium Plasma Coater (OPC) is the plasma coating device that uses the D.C. glow discharge method to coat conductive thin film mainly for SEM samples.


*OPC60A (switch type) will be discontinued from production and sales as of November 2023. Maintenance, repairs and other support will continue to be handled (scheduled to end in 2033).
*If you are considering upgrading to the successor model OPC-EVO , please contact us. 


Conductive ultra-thin film mechanism

Conductive ultra thin film deposition mechanism can be optionally installed on standard type.
In addition, it is possible to attach an option to a device(compatible model) that has already been used.
Optional mounting is possible with the following 3 patterns.
・Low current system only
・Mixed gas system only
・Both Low current system and Mixed gas system

The Mixed gas system of the conductive ultra-thin film mechanism and the hydrophilization treatment mechanism can not be installed at the same time.
In addition, the external dimensions and weight of the main unit change with the optional installation.
(Please contact us for details.)

The film forming method used for the conductive thin film mechanism is patented by 「Filgen, Inc.」.
Patent
name
Conductive ultra thin film mechanism
(low current method)
Patent
number
No. 5419723
Title of
invention
Plasma film forming method of conductive thin film


Comparison of 「Both Low current system and Mixed gas system」 mounting type
   and 「Low current system」 mounting type



OPC80T-LM equipped with
both Low current system and Mixed gas system
OPC80T-L equipped with
Low current system
The OPC80T-LM is a standard type of Osmium plasma coater with a Low current system and Mixed gas system additionally installed.
Anyone can use the OPC80T-LM to reproducibly deposit about 0.5 to 3nm of ultra-thin osmium film.
You can also deposit without opotion systems.
The OPC80T-L is standard type of Osmium plasma coater with a low current system additionally installed.
Anyone can use the OPC80T-LM to reproducibly deposit about 0.5 to 3nm of ultra-thin osmium film.
You can also deposit without opotion systems.

Technical data「Osmium ultra thin film-Cross-sectional image of plasma-polymerized film by TEM」


Low current system and Mixed gas system

●Low current system The low current system uses the method of forming a film with a low discharge current using a method of applying a voltage from a high vacuum state where the concentration of OsO4 gas is low and glow discharge does not start.
●Mixed gas system The mixed gas system reduces the concentration of OsO4 gas by mixing an inert gas into the OsO4 gas, and facilitates the control of ultra thin film deposition by reducing the deposition growth rate.
It is also possible to discharge using only inert gas, and it has scalability to applications such as etching.


Price

【Price When installing an optional mechanism at the same time as purchasing a new divice】
Optional mechanism Compatible models Model name
after mounting option
Price
Low current system
of conductive ultra thin film mechanism
OPC80T OPC80T-L Ask for a quote
OPC60A OPC60A-L Discontinued
Mixed gas system
of conductive ultra thin film mechanism
OPC80T OPC80T-M Ask for a quote
Both Low current system
and Mixed gas system
of conductive ultra thin film mechanism
OPC80T OPC80T-LM Ask for a quote
The Mixed gas system of the conductive ultra-thin film mechanism and the hydrophilization treatment mechanism can not be installed at the same time.

【Price when installing the optional mechanism on the device already delivered】
Optional mechanism Compatible models Model name
after mounting option
Price
Low current system
of conductive ultra thin film mechanism
OPC80/OPC80T OPC80-L/OPC80T-L Ask for a quote
OPC60/OPC60A OPC60-L/OPC60A-L Discontinued
Mixed gas system
of conductive ultra thin film mechanism
OPC80/OPC80T OPC80-M/OPC80T-M Ask for a quote
Both Low current system
and Mixed gas system
of conductive ultra thin film mechanism
OPC80/OPC80T OPC80-LM/OPC80T-LM Ask for a quote
The Mixed gas system of the conductive ultra-thin film mechanism and the hydrophilization treatment mechanism can not be installed at the same time.
If you want to add an optional mechanism to the delivered device, we will send you a cardboard or alminum case for packing. Please put it in and send it back.
The above prices do not include shipping charges.

Inquiries Reagent & Scientific Instrument Dept.: biosupport@filgen.jp P.+81-52-624-4388 https://filgen.jp/
Copyright (C) 2004-2023 Filgen, Inc. All Rights Reserved.