Products Guide What's New!(JP)　Products(About Us)　Catalogue　　　　 Company Profile Profile　Map　Contact Us　Business Partner　License・Patent(JP) Home＞Scientific Instruments＞Osmium Plasma Coater＞Technical data＞Coss sectional TEM image alternately laminated film Japanese Scientific Instruments UV Ozone Cleaner Osmium Plasma Coater + Product details + Lineup + Accessories + Technical data ・ MgO crystals ・ Human Lymphocyte ・ Barium Titanate ・ Ant ・ Rat Liver ・ Chicken Leg Tendon ・ Resist Hole ・ Silicon Wafer ・ Protective film for FIB ・ Silicon under FIB ・ Cross sectional TEM image alternately laminated film ・ Trench observation of silicon wafer ・ Conductive ultra-thin film coating mechanism Hydrophilization treatment ・ Naphthalene - Osmium Hybrid coating + Contract service + Maintenance Vacuum Electron Staining Apparatus Conductive thin film production device for electron microscope sample preparation Osmium Plasma Coater Product details/Lineup/Accessories/Technical data/Contract service/Maintenance Osmium Plasma Coater(OPC) is the plasma coating device that uses the DC glow discharge method to coat conductive thin film mainly for SEM samples. Technical data SEM images MgO crystals/Human Lymphocyte/Barium Titanate/Ant/Rat Liver/Chicken Leg Tendon/Resist Hole/Silicon Wafer Others Protective film for FIB/Silicon under FIB/Cross sectional TEM image alternately laminated film/Trench observation of silicon wafer/Conductive ultra-thin film coating mechanism Hydrophilization treatment/Naphthalene - Osmium Hybrid coating Cross sectional TEM image alternately laminated film The repeatability of the film thickness was confirmed by alternately laminating the osmium ultra-thin film and the plasma-polymerized film. ■Sample：Epoxy block　Size：10mmφ×3mmｔ Condition1 ① Plasma-polymerized film and osmium film are alternately coated on epoxy block with low current method. Each setting film thickness is as follows. 　　Naphthalene　　10nm　　6 layers 　　Osmium　　　 　　1nm　　5 layers ② Re-embedded epoxy block with epoxy resin ③ After cross-sectioning with an ultramicrotome, perform TEM observation. ⇒ Condition2 ① Plasma-polymerized film and osmium film are alternately coated on epoxy block by mixed gas method. Each setting film thickness is as follows. 　　Naphthalene　　10nm　　7 layers 　　Osmium　　　 　　1nm　　6 layers(*) (*However, only the 4th layers was discharged for 4 seconds without mixed gas.) ② Re-embedded epoxy block with epoxy resin ③ After cross-sectioning with an ultramicrotome, perform TEM observation ⇒ 【Inquiries】 Reagent & Scientific Instrument Dept. Phone +81-52-624-4388 https://filgen.jp/ Copyright (C) 2004-2024　Filgen, Inc.　All Rights Reserved.