Direct Magnification: 10,000X
|
|
Direct Magnification: 100,000X |
|
Coating Device |
Osmium Plasma Coater |
Coating Material |
Osmium |
Coating Thickness |
3 nm |
Accelerating Voltage |
10.0 kV |
|
Direct Magnification: 10,000X |
|
Direct Magnification: 100,000X |
Coating Device |
Magnetron Sputter |
Coating Material |
Pt-Pd |
Coating Thickness |
3 nm |
Accelerating Voltage |
10.0 kV |
|
Direct Magnification: 10,000X |
|
|
Direct Magnification: 100,000X |
Coating Device |
Ion Beam Sputter |
Coating Material |
W |
Coating Thickness |
1.5 nm |
Accelerating Voltage |
10.0 kV |
|
|