Products Guide What's New!(JP)　Products(About Us)　Catalogue　　　　 Company Profile Profile　Map　Contact Us　Business Partner　License・Patent(JP) Home＞Scientific Instruments＞Osmium Plasma Coater＞Technical data＞Trench observation of silicon wafer Japanese Scientific Instruments UV Ozone Cleaner Osmium Plasma Coater + Product details + Lineup + Accessories + Technical data ・ MgO crystals ・ Human Lymphocyte ・ Barium Titanate ・ Ant ・ Rat Liver ・ Chicken Leg Tendon ・ Resist Hole ・ Silicon Wafer ・ Protective film for FIB ・ Silicon under FIB ・ Cross sectional TEM image alternately laminated film ・ Trench observation of silicon wafer ・ Conductive ultra-thin film coating mechanism Hydrophilization treatment ・ Naphthalene - Osmium Hybrid coating + Contract service + Maintenance Vacuum Electron Staining Apparatus Conductive thin film production device for electron microscope sample preparation Osmium Plasma Coater Product details/Lineup/Accessories/Technical data/Contract service/Maintenance Osmium Plasma Coater(OPC) is the plasma coating device that uses the DC glow discharge method to coat conductive thin film mainly for SEM samples. テクニカルデータ Technical data SEM images MgO crystals/Human Lymphocyte/Barium Titanate/Ant/Rat Liver/Chicken Leg Tendon/Resist Hole/Silicon Wafer Others Protective film for FIB/Silicon under FIB/Cross sectional TEM image alternately laminated film/Trench observation of silicon wafer/Conductive ultra-thin film coating mechanism Hydrophilization treatment/Naphthalene - Osmium Hybrid coating Trench observation of silicon wafer by plasma polymerized film ■Sample：Trench of silicon wafer　 → Observation of Replica membrane(Plasma polymerization film) with dissolved sample by TEM 　　　　　　　　　　　　　　　　　↓　　Enlarge 【Inquiries】 Reagent & Scientific Instrument Dept. Phone +81-52-624-4388 https://filgen.jp/ Copyright (C) 2004-2024　Filgen, Inc.　All Rights Reserved.