Products Guide
What's New!(JP)
Products(About Us)
Catalogue
Company Profile
Profile
Map
Contact Us
Business Partner
License・Patent(JP)
Home
>
Scientific Instruments
>
Osmium Plasma Coater
>
Technical data
>SEM Image Collection(Silicon Wafer Resist Sample)
Japanese
Scientific Instruments
UV Ozone Cleaner
Osmium Plasma Coater
+
Product details
+
Lineup
+
Accessories
+
Technical data
・
MgO crystals
・
Human Lymphocyte
・
Barium Titanate
・
Ant
・
Rat Liver
・
Chicken Leg Tendon
・
Resist Hole
・
Silicon Wafer
・
Protective film for FIB
・
Silicon under FIB
・
Cross sectional TEM image alternately laminated film
・
Trench observation of silicon wafer
・
Conductive ultra-thin film coating mechanism Hydrophilization treatment
・
Naphthalene - Osmium Hybrid coating
+
Contract service
+
Maintenance
Vacuum Electron Staining Apparatus
Conductive thin film production device for electron microscope sample preparation
Osmium Plasma Coater
Product details
/
Lineup
/
Accessories
/
Technical data
/
Contract service
/
Maintenance
Osmium Plasma Coater(OPC) is the plasma coating device that uses the DC glow discharge method to coat conductive thin film mainly for SEM samples.
Technical data
SEM images
MgO crystals
/
Human Lymphocyte
/
Barium Titanate
/
Ant
/
Rat Liver
/
Chicken Leg Tendon
/
Resist Hole
/
Silicon Wafer
Others
Protective film for FIB
/
Silicon under FIB
/
Cross sectional TEM image alternately laminated film
/
Trench observation of silicon wafer
/
Conductive ultra-thin film coating mechanism Hydrophilization treatment
/
Naphthalene - Osmium Hybrid coating
Silicon Wafer Resist Sample
Direct Magnification: 60,000X
Direct Magnification: 150,000X
Coating Device
Osmium Plasma Coater
Coating Material
Osmium
Coating Thickness
3 nm
Accelerating Voltage
5.0 kV
【Inquiries】
Reagent & Scientific Instrument Dept.
Phone +81-52-624-4388
https://filgen.jp/
Copyright (C) 2004-2024 Filgen, Inc. All Rights Reserved.